Arutiun P. Ehiasarian Sheffield Hallam University, UK
For seminal contributions to the science, industrialization, as well as popularization of high power impulse magnetron sputtering including its use in substrate pre-treatment and deposition of coatings.
2024
Gregory Abadias CNRS-Université de Poitiers, France
For pioneering contributions to the fundamental understanding of intrinsic stress generation and evolution in thin films and coatings
2023
Paul Mayrhofer Technische Universität Wien (TU Wien), Austria
For seminal contributions to materials-science-based guidelines for improved thermal stability, strength and toughness of nitride and boride based thin films
2022
Diederik Depla Ghent University, Belgium
For his persistence to unravel the fundamental processes during reactive magnetron sputter deposition
2021
Daniel Gall Rensselaer Polytechnic Institute (RPI), USA
For seminal contributions to furthering the understanding of thin film growth of transition metal nitrides and their electronic, optical, mechanical, and tribological properties
2020
Jochen Schneider RWTH Aachen University, Germany
For seminal contributions to the quantum mechanically guided design of coating materials
