{"id":642,"date":"2020-01-29T08:00:02","date_gmt":"2020-01-29T07:00:02","guid":{"rendered":"http:\/\/www.avs-ased.org\/wp\/?page_id=642"},"modified":"2025-05-06T15:50:43","modified_gmt":"2025-05-06T13:50:43","slug":"bill-sproul-award","status":"publish","type":"page","link":"http:\/\/www.avs-ased.org\/wp\/?page_id=642","title":{"rendered":"Bill Sproul Award"},"content":{"rendered":"\n\n\n\n\n\n\n\n
2025<\/strong><\/td>\n\"\"<\/td>\nArutiun P. Ehiasarian <\/strong><\/span><\/span>Sheffield Hallam University, UK<\/td>\nFor seminal contributions to the science, industrialization, as well as popularization of high power impulse magnetron sputtering including its use in substrate pre-treatment and deposition of coatings.<\/em><\/td>\n<\/tr>\n
2024<\/strong><\/span><\/td>\n\"\"<\/td>\nGregory Abadias <\/span><\/span>CNRS-Universit\u00e9 de Poitiers, France<\/td>\nFor pioneering contributions to the fundamental understanding of intrinsic stress generation and evolution in thin films and coatings<\/em><\/span><\/td>\n<\/tr>\n
2023<\/strong><\/td>\n\"\"<\/td>\nPaul Mayrhofer <\/span><\/span>Technische Universit\u00e4t Wien (TU Wien), Austria<\/td>\nFor\u00a0seminal contributions to materials-science-based guidelines for improved thermal stability, strength and toughness of nitride and boride based thin films<\/span><\/em><\/td>\n<\/tr>\n
2022<\/strong><\/td>\n\"\"<\/td>\nDiederik Depla <\/strong><\/span><\/span><\/span>Ghent University, Belgium<\/td>\nFor his persistence to unravel the fundamental processes during\u00a0reactive magnetron sputter deposition<\/em><\/td>\n<\/tr>\n
2021<\/strong><\/td>\n\"\"<\/td>\nDaniel Gall <\/span><\/span>Rensselaer Polytechnic Institute (RPI), USA<\/td>\nFor seminal contributions to furthering the understanding of thin film growth of transition metal nitrides and their electronic, optical, mechanical, and tribological properties<\/em><\/td>\n<\/tr>\n
2020<\/strong><\/td>\n\"\"<\/td>\nJochen<\/span> Schneider\u00a0<\/b>RWTH Aachen University, Germany<\/span>\u00a0<\/strong><\/strong><\/td>\nFor seminal contributions to the quantum mechanically guided design of coating materials<\/em><\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n","protected":false},"excerpt":{"rendered":"

2025 Arutiun P. Ehiasarian Sheffield Hallam University, UK For seminal contributions to the science, industrialization, as well as popularization of high power impulse magnetron sputtering including its use in substrate pre-treatment and deposition of coatings.Continue reading<\/a><\/p>\n","protected":false},"author":6,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"simple-restrict-permission":[],"amp_enabled":true,"_links":{"self":[{"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/pages\/642"}],"collection":[{"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/users\/6"}],"replies":[{"embeddable":true,"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=%2Fwp%2Fv2%2Fcomments&post=642"}],"version-history":[{"count":16,"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/pages\/642\/revisions"}],"predecessor-version":[{"id":1164,"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=\/wp\/v2\/pages\/642\/revisions\/1164"}],"wp:attachment":[{"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=%2Fwp%2Fv2%2Fmedia&parent=642"}],"wp:term":[{"taxonomy":"simple-restrict-permission","embeddable":true,"href":"http:\/\/www.avs-ased.org\/wp\/index.php?rest_route=%2Fwp%2Fv2%2Fsimple-restrict-permission&post=642"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}