| 2025 |
 |
Arutiun P. Ehiasarian Sheffield Hallam University, UK |
For seminal contributions to the science, industrialization, as well as popularization of high power impulse magnetron sputtering including its use in substrate pre-treatment and deposition of coatings. |
| 2024 |
 |
Gregory Abadias CNRS-Université de Poitiers, France |
For pioneering contributions to the fundamental understanding of intrinsic stress generation and evolution in thin films and coatings |
| 2023 |
 |
Paul Mayrhofer Technische Universität Wien (TU Wien), Austria |
For seminal contributions to materials-science-based guidelines for improved thermal stability, strength and toughness of nitride and boride based thin films |
| 2022 |
 |
Diederik Depla Ghent University, Belgium |
For his persistence to unravel the fundamental processes during reactive magnetron sputter deposition |
| 2021 |
 |
Daniel Gall Rensselaer Polytechnic Institute (RPI), USA |
For seminal contributions to furthering the understanding of thin film growth of transition metal nitrides and their electronic, optical, mechanical, and tribological properties |
| 2020 |
 |
Jochen Schneider RWTH Aachen University, Germany |
For seminal contributions to the quantum mechanically guided design of coating materials |
